Parabolic opening in atomic layer deposited TiO_2 nanobeam operating in visible wavelengths
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چکیده
منابع مشابه
Atomic layer deposited high-k nanolaminate capacitors
Al2O3–Ta2O5 nanolaminate films were prepared via atomic layer deposition (ALD) on silicon with a single overall composition and thickness, but with a varying number of Al2O3/Ta2O5 bilayers. The composition of the films was roughly 57% Al2O3 and 43% Ta2O5 and the total film thickness was held at 58 nm, while the number of bilayers was varied from 3 to 192 by changing the target bilayer thickness...
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Aalto University, P.O. Box 11000, FI-00076 Aalto www.aalto.fi Author Tapani Alasaarela Name of the doctoral dissertation Atomic layer deposited titanium dioxide in optical waveguiding applications Publisher School of Electrical Engineering Unit Department of Microand Nanosciences Series Aalto University publication series DOCTORAL DISSERTATIONS 57/2011 Field of research Photonics Manuscript sub...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2015
ISSN: 1094-4087
DOI: 10.1364/oe.23.014973